Atomic Layer Deposition 2e

By David Cameron, Tommi Kaariainen, Marja-Leena Kaariainen, et al.

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

• Format: Hardcover
• Language: English
• ISBN: 1118062779
• ISBN13: 9781118062777
• Release Date: May 2013
• Publisher: Wiley-Scrivener
• Length: 272 Pages
• Weight: 1.25 lbs.
• Dimensions: 0.9" x 6.1" x 9.3"